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Semiconductor, Nanotechnology, MEMS Products
LAMBDA SERIES
Vacuum Chamber With External Heating or Gas Flow-Through
Advanced HMI control
Temperatures to 1200°C
Suggested Processes:
Diffusion, Poly, TEOS, Oxidation, LTO, Nitride
See Brochure or View Specs [pdf]
The Lambda Series of process systems provides a choice of two tube diameters, two temperature ranges and six process types. This series is a single-tube; stand-alone system designed for the needs of R&D and small production facilities. Systems are available for Oxidation, Poly, Nitride, Diffusion, and TEOS. Omnisoph© Control System.
Benefits:
- Easily customized
- Designed for ease of operation
- Low cost
- Diffusion, Oxidation, Poly, Nitride, and TEOS
- Tabletop, single-tube for reduced space
- Temperature ranges to 1200°C
- Compatible with modern production facilities
- Full interfacing available for SECSII and GEM
- Allows compatibility of equipment with different processes
- Compatible with all safety standards
- Automation available
- Minimal maintenance costs
Features:
- Two tube sizes
- Tabletop design
- Complete turnkey system with quartzware and gas panel
- All pumps supplied where required
- Fully computer controlled with SECII and GEM options
- Full HMI interface with flat panel touch screen
- 12 models to meet your process needs
- Powered from 208v 3-phase power for easy installation
For information on any of these products or on customizing
options, please contact Applied
Thermal Systems, Inc., or your local representative.
Leasing options available.
